Beamline status reports
Please find the beamline status reports on https://maxiv-legacy.maxiv.lu.se/science/reports/
| Beamline | Techniques | Energy Range | Beam Size | |
|---|---|---|---|---|
| BLOCH | high resolution angle-resolved photoelectron spectroscopy (ARPES), optionally spin resolved (Spin-ARPES) and core-level spectroscopy (CLS) | 10 -1000 eV | 10μm x 25μm (VxH) | |
| Balder | XAS, XES | 2.4 - 40 keV | defocused V ~0.1-2 mm x H ~ 2-9 mm, focused 100 x 100 µm2 | |
| BioMAX | MX, MAD, SAD, SSAD, Atomic resolution data collection, Large sample ensemble screening, In situ crystal diffraction | 5-25 keV | 20 μm x 5 μm | |
| CoSAXS | SAXS, BioSAXS, Time resolved SAXS, Micro beam SAXS, Anomalous SAXS, XPCS | 4-20 keV | Typically 100x100 μm2 at the sample, down to 10x10 μm2 | |
| DanMAX | Powder X-ray diffraction, Full-field imaging, absorption, phase and diffraction contrast tomography. | 15-35 keV | 15 µm - 1.1 mm | |
| FemtoMAX | Time-resolved X-ray scattering, Time-resolved X-ray spectroscopies, Time-resolved SAXS, Time-resolved reflectivity | 1.8 keV - 20 keV | Unfocused 1 mm diameter; Focused 0.04 mm dia; With cylindric Be-lenses 0.01 mm x 0.04 mm v x h | |
| FLEXPES | High-resolution XPS and XAS, resonant photoemission (ResPES) and angle-resolved valence band spectroscopy (ARPES), electron-ion coincidence experiments | 40 to 1500 eV | From 50 μm to 2 mm | |
| FinEstBEAMS | XPS, XAS, PEPICO, TOF | 4.3 eV - 1000 eV (288 nm - 1.24 nm) | 0.1 (V) x 0.1 (H) mm, best: 0.02 (V) x 0.1 (H) mm | |
| ForMAX | Full-field microtomography, SWAXS, scanning SWAXS imaging | 8-25 keV | ~ 10 µm - 1 mm; smaller and larger beam size will become available with secondary optics | |
| HIPPIE | AP-XPS, AP-XAS | 110-2000 eV (full range), 263-1200 eV (full circular polarisation) | 50 µm x 50 µm | |
| MAXPEEM | LEEM, DF-LEEM, UVPEEM, XPEEM, DF-XPEEM, micro-ARPES, micro-LEED, XMCD, micro-XAS | 30 - 1200eV | minimum 16x16μm^2, maximum 50x50μm^2 | |
| MicroMAX | MX: rotational crystallography, serial crystallography, time-resolved crystallography | 5-25 keV | 5 μm x 5 μm and larger. Later focusing down to 1 μm x 1 μm will become available | |
| NanoMAX | Scanning transmission microscopy (STXM) with absorption and phase contrast X-ray fluorescence microscopy (XRF) Coherent diffraction imaging techniques (CDI) Ptychography in forward direction and Bragg geometry | 5 - 30 keV | 300nm – 30 nm. Mature goal 10 nm | |
| SoftiMAX | STXM, Ptychography, Fourier Transform Holography | 250 – 2500 eV with full polarization control | 25 nm (STXM), 100 nm (Ptychography), 20 μm (Fourier Transform Holography) | |
| SPECIES | RIXS, NEXAFS, XPS, HP-XPS, XAS | 27 – 1500 eV (linear polarization) 40 – 300 eV (circular polarization) Elliptically polarizing EPU61 undulator Period length 61mm, 40 periods 16 mm minimum gap Collimated plane grating monochromator (FMB Berlin) | RIXS 5×25 μm2 HP-XPS 100×100 μm2 | |
| VERITAS | RIXS | 275-1000 eV | 1×5 μm2 |